Professor of Center for Science of Environment and Energy, Director of Keio Leading-edge Laboratory of Science and Technology, Keio University

Biography: 1985:Graduated from Inorganic Materials departmen of Tokyo Instute of Technology 1990:phD from Nuclear Engineering Department of Tokyo Instute of Technology 2005:Professor of Enviroment and Energy Department of Keio University 2013-present:Director of Keio Leading-Edge Laboratory

Speech Title: Synthesized of hard carbon films by atmospheric pressure filamentary dielectric barrier discharge
Aims: In this study, we synthesized a-C:H films by filamentary dielectric barrier discharge (FDBD) to improve their characteristics compared to the films synthesized by atmospheric pressure plasma-enhanced chemical vapor deposition.

Methods: To generate FDBD with a large number of streamers between the electrodes of DBD equipment, we employed the substrates with varying surface resistivity. The a-C:H films were synthesized by FDBD with various electrodes gaps.

Results: The discharge type was transited from glow DBD (GDBD) to FDBD by increasing the gap between the electrodes from 1 mm to 4 mm when the surface resistivity of substrates was lower than 530 /sq. and mixture of He and Ar were used as a dilution gas. The hydrogen concentration of the a-C:H films synthesized by FDBD was reduced compared to that of the films synthesized by GDBD. The hardness of the films increased from 3.7 GPa to 11.9 GPa by using FDBD.

Conclusions: These results show that the hard a-C:H films can be synthesized at low temperature in a large area by FDBD..